Description |
It states that in this stage, the substrate is ready for producing the desired devices. It introduces lithography as an important method. It talks about its advantages. How it is set. Then it talks about different parameters such as resolution, it gives some details and talks about the uses of this method. |
Mental Challenge |
Today, all ICs are practically produced by lithography. Why? |
Quizzes and Activities |
.Activity: Research the advantages and disadvantages of lithography. |
Further Reading Sources |
1.https://www.osti.gov/biblio/1115031 |
| Wave - Particle Duality | 12:25 | |
| Particle in a Box | 07:46 |
| Lattice and Crystal | 10:46 | |
| Band Theory | 18:04 | |
| Heterostructures | 09:40 |
| Laser Mechanism Basics | 09:14 | |
| Direct and Indirect Energy gap | 13:04 | |
| Quantum Dots 1 | 13:15 | |
| Quantum Dots 2 | 16:18 | |
| Quantum Dots 3 | 10:26 |
| Carbon Properties | 20:42 | |
| Carbon Applications | 10:43 |
| Semiconductor devices | 26:52 | |
| PN Junction | 12:38 | |
| MOS Transistor | 14:35 | |
| Silicon Crystal | 25:50 | |
| Silicon Crystal Growth | 13:45 | |
| Contamination Reduction - Clean Room | 21:03 | |
| Contamination Reduction - Cleaning | 11:53 | |
| Contamination Reduction - Adsorption | 11:37 |
| Introduction to lithography | 08:18 | |
| Historical Development and Essential Concepts | 14:31 | |
| Optical Sources | 12:52 | |
| Optical Principles | 08:18 | |
| Fraunhofer and Fresnel Diffraction | 21:01 | |
| Photo Sensitive Protectors | 18:11 |
| Quantum Computers | 19:38 |