Electron Beam Lithography

Category General
Difficulty Level Normal
Audience Level General
Description Top-down and bottom-up methods are two types of approaches used in nanofabrication. In this course, synthesis techniques which are known as top-down approach are presented.
Overview
Top-down approach means a view from top(larger) to bottom(smaller). This approach is similar to making a statue made of stone. As in making of a statue, a bulk or big piece of stone is taken, similarly in top-down approach; a bulk piece of material is taken. Then carving and cutting is done until desired shape is achieved. Example: Different kinds of lithographic techniques include cutting, etching, grinding and ball milling technique.
In this course, top-down approach is taken into consideration. By the end of this course, students would be able to choose the right technique to achieve desired nanomaterial.

Booklet
Description
It talks about nanolithography being a top-down method. Goes through scanning electron beam lithography, method, and equipment. And, it ends with a brief history on scanning electron beam lithography.

Mental Challenge
How does scanning electron beam lithography work for nano?

Quizzes and Activities

Activity: Research the advantages and disadvantages of scanning electron beam lithography vs. photolithography. Prepare a table.




Further Reading Sources

1.Limiting Factors in Sub-10 nm Scanning-Electron-Beam Lithography

2.Electron-Beam Lithography towards the Atomic Scale and Applications to nano-optics, chapter 5